Fig. 1From: Realization of large-scale sub-10 nm nanogratings using a repetitive wet-chemical oxidation and etching techniqueSchematics of the fabrication process. a Ultra-thin nanogratings were produced from initial nanogratings by repetitive oxidation and etching cycles. One cycle consists of an oxidation process in nitric acid and an etching process in diluted hydrofluoric acid. b Growth of silicon oxide with respect to time in the oxidation process; silicon oxide grows until the saturation point, and then remains at a constant saturated thickness (Tox, sat) after this saturation timeBack to article page