Fig. 15From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a reviewA schematic model explaining the etch rate enhancement and its decay observed in an activated water by means of microwave irradiation. Structure of a natural water composed of clusters of water molecules, b activated water containing many unbonded free water molecules, and c time consuming rebuilding of water clusters [84], © 2004, ElsevierBack to article page