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Micro and Nano Systems Letters
Fig. 1 | Micro and Nano Systems Letters

Fig. 1

From: Optimization of selective laser-induced etching (SLE) for fabrication of 3D glass microfluidic device with multi-layer micro channels

Fig. 1

Single channel etch result using different pulse energy (Ep), pulse repetition rate (Rr), and scan speed (Ss). Etching time in KOH was 6 h. Optical images of fabricated channels with Ep: 300 nJ, 600 nJ, 1000 nJ, Ss: 50 mm/s at different repetition rates a Rr: 500 kHz, and b Rr: 1000 kHz, c a graph of the selectivity according to various combinations of pulse energy, pulse repetition rate, and scan speed

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