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Fig. 2 | Micro and Nano Systems Letters

Fig. 2

From: Determination of precise crystallographic directions on Si{111} wafers using self-aligning pre-etched pattern

Fig. 2

Schematic representation of the wet anisotropically etched profiles of different shapes mask geometries on Si{111} wafer: a mask pattern on wafer surface, b etched profile after wet anisotropic etching, and c cross sectional view of etched profiles. Dashed lines in a indicate the directions where wet etch will terminate due to the appearance of {111} planes

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