Skip to main content
Fig. 24 | Micro and Nano Systems Letters

Fig. 24

From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS

Fig. 24

Optical images of the etched patterns of a technique presented in Fig. 23 showing the self-aligning nature of the structures zoomed at different magnifications. At the precise ⟨110⟩ direction, the notches of the four hexagons aligns exactly to each other while getting misaligned at directions away from ⟨110⟩. The central pattern exhibits the precise alignment of notches. At the same time, the immediately adjacent patterns (both top and bottom) can be seen misaligned. As a result the ⟨110⟩ direction appears obvious

Back to article page