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Micro and Nano Systems Letters
Figure 4 | Micro and Nano Systems Letters

Figure 4

From: Sidewall lithography of micron-sized features in high-aspect-ratio meso-scale channels using a three-dimensional assembled mask

Figure 4

Exposure test results of spin-coated 1.4 μm-thick positive-tone photoresist (S1813, Shipley, 600 μm-diameter pattern, λ = 365 nm, exposure dose: 7,000 mJ/cm2, Purple dot represents the pattern height vs. pattern location on xy plane. Blue diamond, green rectangle, and red circle represent pattern height vs. y position, pattern height vs. x position, and pattern location on xy plane, respectively.); (a) without diffuser, (b) with diffuser.

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