Fig. 7From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a reviewSEM images of micro-pyramids on Si{100} surface after 30 min etching in 4.0 M KOH at 70 ℃: a top view and b tilted view at 30° from {100} surface [77], © 1996 IOP PublishingBack to article page