Fig. 20From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMSReprinted from [103], © 2002 IOP Publishing, reproduced with permissionThe pre-etched pattern proposed by Tseng and Chang showing the a location of the patterns and the deviation of the adjacent corners of the etched profile when there is i no deviation, ii equal deviation in opposite direction and iii unequal deviation in opposite direction [103]. In case of no deviation, the ⟨100⟩ directions passes through the middle of the corners of the hexagons. In case of equal deviation, the ⟨100⟩ direction passes through the center of the hexagon. In case of unequal deviation, the ⟨100⟩ direction passes in between the two corners depending on the magnitude of the deviationBack to article page