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Micro and Nano Systems Letters
Fig. 18 | Micro and Nano Systems Letters

Fig. 18

From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS

Fig. 18

Reproduced with permission from [110], © 2016 IOP Publishing

Optical image of the etched profile of the pattern shown in Fig. 17 at two different magnifications. At the precise ⟨100⟩ direction (centre pattern), the notches self-aligns itself to each other making it easily distinguishable with visual inspection. Moving away from the precise direction, the misalignment of the notches increases. This self-aligning features makes the precise ⟨100⟩ direction obvious and inhibits the need of measurement of any kind

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