Fig. 9From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a reviewTwo models of micro-pyramid growth, both assuming etched products as micro-masking materials: a H2 bubble sticks/grows on etched surface randomly [80], © 1997 IOP Publishing, and b Silicate particles accumulated on protruding edges according to a time sequence of etching [82], © 2001 ElsevierBack to article page