Fig. 38From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a reviewSEM images of the etched Si{100} surface with various concentrations of ammonium persulfate (AP): a 1.0 g AP, b 2.5 g AP, c 5.0 g AP in per 500 mL 10 wt% TMAH at 70 °C [109], © 2015, SpringerBack to article page