Fig. 27
From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
Etch rate and surface roughness of Si{100} without and with addition of different amount of a ammonium persulfate (AP), b pyrazine, and c ammonium hydrogen sulfate (AHS) in per 500 mL 10 wt% TMAH at 70 °C [109], © 2015, Springer