Fig. 21
From: High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
a Temperature dependent etched surface roughness of Si{100} in 25 wt% TMAH with Triton-X-100 in a volume fraction from 0.01–1%. Etched surface morphologies of the samples corresponding to points A and B: b optical micrographs, c SEM images and d AFM results [69], © 2014, IET