Fig. 4From: Microstructure-based analysis of fine metal mask cleaning in organic light emitting diode display manufacturingFeasibility test of the cleanliness analytical method: a picture of FMM-mimic microstructure after Alq3 film deposition, b SEM images of the gap after Alq3 film deposition (before cleaning) and c–e fluorescence microscopic images at the inspection regions (1, 2, 3) for cleaning time (Arabic numbers indicated the inspection regions, respectively)Back to article page