Fig. 8
Reprinted from [76], © 2006 IOP Publishing, reproduced with permission
Fabrication of channels using the cleaved-edge as the reference direction: a optical photograph of a cleaved edge on {110} wafer, b long channels (black portion) fabricated on Si{110} using cleaved edge as the reference direction, c a micrograph of the sidewall of fabricated channels. It can be seen that the sidewall of the channel is rough and the shape of the channels is distorted due to the misalignment of mask edges with exact crystallographic directions