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Fig. 6 | Micro and Nano Systems Letters

Fig. 6

From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS

Fig. 6

Schematic view showing the fabrication of diaphragm on Si{100} wafer: a deposition of thin film of diaphragm material (e.g. SiO2), b patterning of backside, c wet anisotropic etching, d cross sectional view of the suspended diaphragm. The dotted lines show the geometry when the mask edges are aligned perfectly along the crystallographic direction, while solid line indicates the over etched geometry due to misalignment

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