Fig. 15From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMSReproduced with permission from [110], © 2016 IOP PublishingSchematic diagram showing the use of Si{110} planes (at ⟨100⟩ direction) slanted at an angle of 45˚ to the wafer surface as micromirrors. The incoming beam is reflected 90˚ out of planeBack to article page