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Micro and Nano Systems Letters
Fig. 13 | Micro and Nano Systems Letters

Fig. 13

From: Determination of precise crystallographic directions for mask alignment in wet bulk micromachining for MEMS

Fig. 13

Reprinted from [107], © 2005 Springer, reproduced with permission

Schematic representation of the technique using pre-etched pattern with tapered ridges as proposed by Chang and Huang: a A part of the patterned structures, b etched profile on Si{100}, c the entire etched patterns on Si{100}, d etched profile on Si{110} [107]. The index of ridge with D = 0 (indexed by T and Tʹ) on both sides of the reference line is used to determine the misalignment

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