Figure 49

Fabrication sequence for the formation of microstructure with protected convex corners using two-step etching: (a) Deposition and patterning of mask layer; (b) Silicon anisotropic etching; (c) Re-deposition of mask layer followed by patterning (d) Second step of anisotropic etching; (e) Removal of mask layer (f) SEM picture of a structure fabricated using similar process steps (with permission from Elsevier, Copyright 2002) [69].