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Micro and Nano Systems Letters
Figure 49 | Micro and Nano Systems Letters

Figure 49

From: A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

Figure 49

Fabrication sequence for the formation of microstructure with protected convex corners using two-step etching: (a) Deposition and patterning of mask layer; (b) Silicon anisotropic etching; (c) Re-deposition of mask layer followed by patterning (d) Second step of anisotropic etching; (e) Removal of mask layer (f) SEM picture of a structure fabricated using similar process steps (with permission from Elsevier, Copyright 2002) [69].

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