Figure 14From: A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching Schematic representation of the surfactant adsorption at the silicon atoms of the convex corners, which belong to {110} planes, in surfactant-added TMAH solution during etching process. The dense layer of surfactant molecules protect the convex corners from etchant that result in the reduction of undercutting.Back to article page