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Figure 5 | Micro and Nano Systems Letters

Figure 5

From: Sidewall lithography of micron-sized features in high-aspect-ratio meso-scale channels using a three-dimensional assembled mask

Figure 5

Patterning and etching results of 600 μm-diameter patterns as a function of pattern location (λ = 365 nm, dose: 8,550 mJ/cm2, Purple dot represents the pattern height vs. pattern location on xy plane. Blue diamond, green rectangle, and red circle represent pattern height vs. y position, pattern height vs. x position, and pattern location on xy plane, respectively.); (a) spray-coated photoresist thickness, (b) pattern vertical dimension, (c) pattern lateral dimension, (d) aluminum etch depth.

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